Close Space Sublimation System

The CSS Furnace is a compact single-wafer system developed for Close Space Sublimation (CSS) and thin film deposition processes.
Designed for both R&D and industrial environments, it offers outstanding flexibility by accommodating a wide range of powders or pellets for diverse coating applications. Its advanced reactor design, combined with secondary vacuum capabilities, ensures ultra-clean processing conditions and excellent repeatability.

The system integrates high performance lamp heating with an efficient cooling unit, enabling rapid heating and cooling ramps together with a high thermal gradient of up to 450 °C. Precise temperature control allows easy process tuning and reliable, reproducible results for thin film applications.

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Features

Equipment capabilities	Up to 210mm square wafers Up to 8’’ Semiconductor round wafers Flexible source material loading (powder, pellet, …)
Materials	Silicon – SiC – GaN – Sapphire – Quartz – Glass – Metal – III-V – III-VI – Superconductors
Machine design	Easy maintenance system Modular, Flexible & Compact footprint CE Certification Industry 4.0 compliant (supervision & robotization on demand)
Reactor design	Excellent process precision and repeatability Ultra clean process conditions 9 heating zones Internal PID temperature control Embedded cooling system
Applications	Medical – Microelectronics – Photovoltaics – Optoelectronics – Sensors – Aeronautics
Process flexibility	Vacuum & secondary vacuum capabilities (< 10-6mbar) Fast heating and cooling High temperature gradient (> 450°C) Multizone lamp furnace ( 50°C < R < 700°C)